PVD vacuum coating equipment and system

• Type: Evaporation deposition, magnetron sputtering, ion beam sputtering, multiple functional

• Vacuum Chamber: Ø600*720H/ Ø800*900H/ Ø1000*1100H/ Others

• Vacuum Pump: Oil diffusion pump / Molecule pump/ Others

• ultimate Vacuum: 8x10˜4 Pa

• Pumpdown Time: 5x10˜3 Pa in 12Min

• Ion cleaning system: Columned cathode / Linear ion source

• Coating source: Evaporation source/ sputtering target/ arc charge source

• Thin film thickness measurement system: optical film thickness monitor/ quartz crystal thickness meter

• Process Gas: Gas flow control system/ Automatic pressure control system

• Heating: Tube heater/ resistance coil/ Bromine tungsten lamp

• Substrate holder drive: upward/ downward

• Substrate holder form: Rotary/planet/sphere/plane

• Electrical control: semi-automated/PLC automated/manual

• Film: Metal film/ oxide film/ mixture film

Application

• Coating film: TiN, TiC, ZrN, CrN, etc.

• Substrates such as plastic, glass or metal and so on which made in mobilephone shells, keys, vision windows and optical lens coated color films and optical films, etc.

ZX800 Series and JZC1000 Series

FZJ1100 Series and ZZS660 Series

ZX660 Series and Chamber inside

Hall ion source and Anode layer ion source

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